Submitted by Greg Herman on Sun, 03/29/2020 - 15:48
Year: 
(2020)
Publication Type: 
Publications
Publication Text: 

“Effect of ambient conditions on radiation-induced chemistries of a nanocluster organotin photoresist for next-generation EUV nanolithography”, J.T. Diulus, R.T. Frederick, D.C. Hutchison, I. Lyubinetsky, R. Addou, M. Nyman, G.S. Herman, ACS Applied Nanomaterials 3, 2266-2277

Project: 
High-Resolution Nanopatterning of Inorganic Resists