Submitted by Greg Herman on Thu, 08/30/2018 - 08:27
Year: 
(2018)
Publication Type: 
Publications
Publication Text: 

“Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo–Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists”, R.P. Oleksak, R.E. Ruther, F. Luo, J.M. Amador, S.R. Decker, M.N. Jackson, J.R. Motley, J.K. Stowers, D. W. Johnson, E.L. Garfunkel, D.A. Keszler, G.S. Herman, ACS Applied Nano Materials 1, 4548-4556.

Project: 
High-Resolution Nanopatterning of Inorganic Resists