Submitted by Greg Herman on Sat, 09/18/2021 - 13:00
Year: 
(2021)
Publication Type: 
Publications
Publication Text: 

“Operando study of the preferential growth of SiO2 during the dry thermal oxidation of Si0.60Ge0.40(001) by ambient pressure x-ray photoelectron spectroscopy”, S.P. Lorona, J.T. Diulus, J.E. Bergevin, R. Addou, G.S. Herman, Journal of Vacuum Science and Technology A 39, 053202

Project: 
Surface and Interfacial Characterization