Oregon State University

Chemical Vapor Deposition

 

Picture of the chemical vapor deposition system in the Owen cleanroom.  
CVD tube furnace  

 

 

Picture of the plasma enhanced chemical vapor deposition system in the Owen cleanroom. The PECVD system in the Owen cleanroom is dedicated to growing silicon dioxide using a dilute silane precursor. 

Semigroup

Plasma Enhanced Chemical Vapor Deposition System

 

 

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