Email:
frederir@onid.oregonstate.edu
Interests:
Characterization of extreme ultraviolet (EUV) sensitive inorganic photoresist thin films with electron stimulated desorption (ESD), temperature programmed desorption (TPD), X-ray photoemission spectroscopy (XPS) including near-ambient pressure (NAP-XPS) techniques on SPECS lab system and at synchrotron end stations (SSRL, ALS), Raman spectroscopy, Atomic Force Microscopy (AFM), and Scanning Electron Microscopy (SEM).
Additional recent work into scanning Tunneling Microscopy (STM) to understand morphology of TiO2 nanoclusters grown in varying deposition conditions, as well as stability during annealing in ultra-high vacuum (UHV). Auger Electron Spectroscopy (AES) was used for coverage and oxidation states.