Submitted by Sheela Surisetty on Sat, 04/12/2014 - 21:26
Year: 
(2014)
Publication Type: 
Publications
Publication Text: 

"Chemical and structural investigation of high-resolution patterning with HafSOx", R.P. Oleksak, R.E. Ruther, F. Luo, K. Fairley, S.R. Decker, W.F. Stickle, D.W. Johnson, E.L. Garfunkel, G.S. Herman, D.A. Keszler, ACS Applied Materials and Interfaces 6, 2917-2921

Project: 
High-Resolution Nanopatterning of Inorganic Resists