Submitted by Greg Herman on Sat, 12/01/2018 - 06:45
Year: 
(2019)
Publication Type: 
Publications
Publication Text: 

“Thermal and Radiation Chemistry of Butyl Tin Oxo Hydroxo: A Model Inorganic Photoresist”, R.T. Frederick, S. Saha, J.T. Diulus, F. Luo, J.M. Amador, M. Li, D.-H. Park, E.L. Garfunkel, D.A. Keszler, G.S. Herman, Microelectronics Engineering 205, 26-31

Project: 
High-Resolution Nanopatterning of Inorganic Resists