Oregon State University


Picture of the Batchtop VII system in the Owen cleanroom  The Batchtop system VII is a reactive ion plasma etcher used primarily for etching silicon dioxide.  Other common processes include, oxygen ash and silicon nitride etch.

Plasma-Therm, Inc.

Batchtop System VII

Reactive Ion Etch

Owen Cleanroom

Dr. John Wager



Picture of a wet bench in the Owen cleanrrom Fume hood and personal protection equipment used for performing wet etch.

Wet Chemical Hood

Owen Cleanroom

Dr. John Wager


Contact Info

Copyright ©  2020 Oregon State University